发明名称 |
Method and system for combined photothermal modulated reflectance and photothermal IR radiometric system |
摘要 |
A method and apparatus for evaluating a semiconductor wafer. A combination of a photothermal modulated reflectance method and system with a photothermal IR radiometry system and method is utilized to provide information which can be used to determine properties of semiconductor wafers being evaluated. The system and method can provide for utilizing a common probe source and a common intensity modulated energy source. The system and method further provide an infrared detector for monitoring changes in infrared radiation emitted from a sample, and photodetector for monitoring changes in beam reflected from the sample.
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申请公布号 |
US2005225765(A1) |
申请公布日期 |
2005.10.13 |
申请号 |
US20050143203 |
申请日期 |
2005.06.02 |
申请人 |
NICOLAIDES LENA;SALONIK ALEX |
发明人 |
NICOLAIDES LENA;SALONIK ALEX |
分类号 |
G01N21/17;G01N21/95;G01N25/72;(IPC1-7):G01N21/00 |
主分类号 |
G01N21/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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