发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high sensitivity, requiring neither heating after exposure nor overcoat layer, and free of degradation of a latent image and a photosensitive lithographic printing plate using the composition, and to particularly provide the photosensitive composition and the photosensitive lithographic printing plate which enhance film strength without changing sensitivity and in which the elution characteristic of a non-image area does not deteriorate even in storage with time. <P>SOLUTION: In the photosensitive composition containing a polymer having a vinyl substituted phenyl group in a side chain, a photo-radical generator and a sensitizer having absorption in a wavelength region of visible light to infrared light for sensitizing the photo-radical generator, a non-polymerizable compound having a thio-ether bond is contained in addition. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005284143(A) 申请公布日期 2005.10.13
申请号 JP20040100554 申请日期 2004.03.30
申请人 MITSUBISHI PAPER MILLS LTD 发明人 DOI KUNIHIRO
分类号 G03F7/004;G03F7/00;G03F7/038 主分类号 G03F7/004
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