发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that has a small-sized and simplified structure by improving a substrate supporting/fixing mechanism. SOLUTION: The substrate processing apparatus includes a substrate supporting pillar 42 that can hold the periphery of a substrate 2 by rotation; a pillar supporter 38 that can rotatably hold the substrate supporting pillar 42; straight advancing means 46, 51 and 53 that are provided in the pillar supporter 38; and coupling means 56 and 43 that couple the straight advancing means and the substrate supporting pillar, convert the straight advancing movement of the straight advancing means to rotary movement, and convey it to the substrate supporting pillar. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005285927(A) 申请公布日期 2005.10.13
申请号 JP20040094823 申请日期 2004.03.29
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 FUKUDA MASANAO;MATSUDA SATOYUKI;TANAKA AKINORI
分类号 H01L21/683;H01L21/205;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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