Method of optimizing imaging performance

摘要

The invention relates to a method of optimizing an imaging performance of a projection exposure system comprising an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field; which method comprises: setting the field to a first exposure field having first field dimensions and a first position within a maximum field exposable by the projection exposure system; setting optical parameters of the projection optical system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field having second field dimensions or/and a second position within said maximum field different from the first field dimension position; changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.