Improved double chamber ion implantation system,申请号GB20030020262-传众专利搜索

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发明名称	Improved double chamber ion implantation system
摘要
申请公布号	GB2392549(B)	申请公布日期	2005.10.12
申请号	GB20030020262	申请日期	2002.03.07
申请人	* ADVANCED TECHNOLOGY MATERIALS, INC.	发明人	MICHAEL C * VELLA;ROBERT L * BROWN
分类号	H01J27/14;H01J37/08;(IPC1-7):H01J27/02	主分类号	H01J27/14
代理机构		代理人
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