发明名称 Analysis model producing/assisting apparatus
摘要 <p>The invention relates to an analysis model producing/assisting apparatus (100) that produces a recognition model (503), approximating surfaces of configuration and ridgelines thereof by planes and lines, from a configuration model (501) showing the configuration. Thereafter, it produces a mapping model (504) through dividing the recognition model (503) into cubic grids, and then produces an analysis model (505), through mapping grid points of the mapping model (504) onto the configuration model (501). When producing the recognition model (503), know-how for producing the analysis model (505), which gives an influence upon quality of the meshes of the analysis model (505), is taken out from a database (104), and that know-how for producing the analysis model (505) is applied onto the configuration model (501).</p>
申请公布号 EP1585039(A2) 申请公布日期 2005.10.12
申请号 EP20040030028 申请日期 2004.12.17
申请人 HITACHI, LTD. 发明人 KATAOKA, ICHIRO;HARIYA, MASAYUKI;ONODERA, MAKOTO;HIRO, YOSHIMITSU
分类号 G06F17/50;(IPC1-7):G06F17/50 主分类号 G06F17/50
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