发明名称 Liquid treatment method using alternating electrical contacts
摘要 A contact is disposed to come into contact with a metal layer formed on a substrate being treated, the contact being in contact with a surface being treated from an opposite surface through a through hole present in a substrate. Alternatively, a contact is disposed to come into contact with a metal layer formed on a substrate, the contact coming into contact at an approximate center of the substrate. Alternatively, a plurality of needle bodies are disposed to be in electrical contact with a metal layer of a substrate being treated, thereby power supply for electrolytic polishing/plating to a substrate being treated being implemented, without restricting to a periphery of a substrate, from a plurality of points on a surface thereof. Due to any one of these, liquid treatment equipment enables to improve uniformity in plane of an electric current sent to a surface being treated and of liquid treatment.
申请公布号 US6953522(B2) 申请公布日期 2005.10.11
申请号 US20010849345 申请日期 2001.05.07
申请人 TOKYO ELECTRON LIMITED 发明人 PARK KYUNGHO;OKASE WATARU;MATSUO TAKENOBU
分类号 C25D7/12;C25F7/00;(IPC1-7):C25D5/00;C25F3/00 主分类号 C25D7/12
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