发明名称 Gradient immersion lithography
摘要 In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.
申请公布号 US6954256(B2) 申请公布日期 2005.10.11
申请号 US20030698012 申请日期 2003.10.31
申请人 ASML NETHERLANDS B.V. 发明人 FLAGELLO DONIS;DOERING JOHN
分类号 H01L21/027;G02B1/10;G03F7/20;(IPC1-7):G03B27/32;G03B27/42;G03B27/52 主分类号 H01L21/027
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