发明名称 |
Polysilicon material and semiconductor devices formed therefrom |
摘要 |
A metal induced lateral crystallization (MILC) poly-silicon material is produced by depositing a metal in a predefined pattern on amorphous silicon, and heat treating the silicon at a first temperature to form a MILC poly-Si material. The MILC poly-Si material is further heat treated at a second temperature higher than the first temperature to induce recrystallization. The second high temperature recrystallization step significantly enhances the material structure, and in particular the grain structure, of the poly-Si material with substantial benefits to the performance of semiconductor devices made therefrom.
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申请公布号 |
US6953716(B2) |
申请公布日期 |
2005.10.11 |
申请号 |
US20030740537 |
申请日期 |
2003.12.22 |
申请人 |
THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY |
发明人 |
WONG MAN;KWOK HOI SING;MENG ZHIGUO;WANG MINGXIANG |
分类号 |
H01L21/00;H01L21/04;H01L21/20;H01L21/324;H01L21/36;(IPC1-7):H01L21/324 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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