发明名称 Polysilicon material and semiconductor devices formed therefrom
摘要 A metal induced lateral crystallization (MILC) poly-silicon material is produced by depositing a metal in a predefined pattern on amorphous silicon, and heat treating the silicon at a first temperature to form a MILC poly-Si material. The MILC poly-Si material is further heat treated at a second temperature higher than the first temperature to induce recrystallization. The second high temperature recrystallization step significantly enhances the material structure, and in particular the grain structure, of the poly-Si material with substantial benefits to the performance of semiconductor devices made therefrom.
申请公布号 US6953716(B2) 申请公布日期 2005.10.11
申请号 US20030740537 申请日期 2003.12.22
申请人 THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY 发明人 WONG MAN;KWOK HOI SING;MENG ZHIGUO;WANG MINGXIANG
分类号 H01L21/00;H01L21/04;H01L21/20;H01L21/324;H01L21/36;(IPC1-7):H01L21/324 主分类号 H01L21/00
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