| 摘要 |
<p>Sulfonium salts which are excellent in transparency to rays having wavelengths of 220nm or below and can attain excellent performances in sensitivity, resolution, pattern shape, LER, storage stability, and so on when used as radiation-sensitive acid generator; and positive radiation-sensitive resin compositions containing the salts as the radiation-sensitive acid generator. The sulfonium salts are represented by the general formula (I): (I) [wherein R1 is halogeno, alkyl, alicyclic hydrocarbyl, alkoxyl, -OR3 (wherein R3 is alicyclic hydrocarbyl), or the like; R2 is (substituted) alkyl, or two or more R2s are united to form a ring structure; p is 0 to 7; q is 0 to 6; n is 0 to 3; and X- is a sulfonate anion]. The positive radiation-sensitive resin compositions comprise (A) radiation-sensitive acid generators consisting of the sulfonium salts and (B) resins having acid-dissociable groups.</p> |
