发明名称 Boosted potential generation circuit and control method
摘要 A boosted potential generation circuit enables a high-speed operation and even miniaturization in a semiconductor memory even if external power supply voltage is reduced in the semiconductor memory. In the boosted potential generation circuit provided with a capacitor MOS transistor and a transfer MOS transistor and used for a DRAM including memory cells, a gate insulating film of the capacitor MOS transistor is thinner than that of the MOS transistor constituting the memory cell to realize a boosted potential generation circuit which has a small area and a large capacity. In this case, preferably, the gate insulating film of the transfer MOS transistor has a thickness which is not greater than that of the gate insulating film of the capacitor MOS transistor.
申请公布号 US6954386(B2) 申请公布日期 2005.10.11
申请号 US20030372000 申请日期 2003.02.20
申请人 HITACHI, LTD. 发明人 NARUI SEIJI;MAE KENJI;MORINO MAKOTO;KUBOUCHI SHUICHI
分类号 G11C11/407;G11C5/14;G11C11/4074;H01L21/822;H01L21/8242;H01L27/04;H01L27/10;H01L27/108;H02M3/07;(IPC1-7):G11C7/00 主分类号 G11C11/407
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