发明名称 |
IMPROVED MEGASONIC CLEANING EFFICIENCY USING AUTO-TUNING OF AN RF GENERATOR AT CONSTANT MAXIMUM EFFICIENCY |
摘要 |
System and method of cleaning a substrate (202) includes a megasonic chamber (206) that includes a transducer (210) and a substrate (202). The transducer (210) is being oriented toward the substrate (202). A variable distance d separates the transducer (210) and the substrate (202). The system (200) also includes a dynamically adjustable RF generator (212) that has an output coupled to the transducer. The dynamically adjustable RF generator (212) can be controlled by a phase comparison of an oscillator output (306) voltage and a phase of an RF generator output voltage. The dynamically adjustable RF generator (212) can also be controlled by monitoring a peak voltage of an output signal and controlling the RF generator to maintain the peak voltage within a predetermined voltage range. The dynamically adjustable RF generator (212) can also be controlled by dynamically controlling a variable DC power supply voltage.
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申请公布号 |
KR20050097992(A) |
申请公布日期 |
2005.10.10 |
申请号 |
KR20057014555 |
申请日期 |
2003.12.23 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BOYD JOHN;KUTHI ANDRAS;THIE WILLIAM;SMITH MICHAEL G.R.;KNOP ROBERT;ANDERSON THOMAS W. |
分类号 |
B06B1/02;B08B3/10;B08B3/12;H01L21/00;(IPC1-7):H01L21/302 |
主分类号 |
B06B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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