| 摘要 |
A treating system comprising a reaction vessel having a substrate to be treated placed therein, a mechanism for supplying a treating gas into the reaction vessel when a substrate is treated, a mechanism for supplying a corrosive cleaning gas into the reaction vessel at cleaning, an exhaust-path member connected to the reaction vessel, a heating means for heating the reaction vessel and a specific part of the exhaust-path member, a means for detecting the temperature of the specific part, a temperature control means for controlling the heating means based on a detection value detected by the temperature detecting means so that the specific part reaches a specified target temperature, and a temperature changing means for changing the target temperature according to different steps --- substrate treating and cleaning. The target temperature is set by the temperature changing means to one at which the deposition of a reaction byproduct on the specific part can be prevented at substrate treating, while it is set to one at which the corrosion of the specific part can be prevented at cleaning.
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