发明名称 METHOD OF FORMING METAL BLANKS FOR SPUTTERING TARGETS
摘要 The present invention relates to an improvement in the manufacture of metal blanks, discs, and sputtering targets by flattening only one of the two surfaces of a metal plate. The elimination of flattening the metal plate's second surface results in a significant cost reduction. The metal plate of the present invention preferably has a single-side flatness of 0.005 inches or less, which improves the reliability of the bond between the target blank and a backing plate. Preferred metals include, but are not limited to, tantalum, niobium, titanium, and alloys thereof. The present invention also relates to machining the first side of a metal plate, bonding the first side to a backing plate, and then optionally machining the second side of the metal plate.
申请公布号 KR20050098002(A) 申请公布日期 2005.10.10
申请号 KR20057014903 申请日期 2004.02.11
申请人 CABOT CORPORATION 发明人 MICHALUK CHRISTOPHER A.
分类号 C22F1/00;C23C14/34;(IPC1-7):C22F1/00 主分类号 C22F1/00
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