发明名称 |
ELECTRON BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To lessen the re-incidence of re-reflected electron on an object in an electron beam device. SOLUTION: The electron beam device having a radiation mechanism that generates the electron beam and radiates the same to the object and a re-reflection preventive mechanism that re-reflects the reflected electron reflected from the object in a direction different from the direction that the reflected electron beam comes in. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005277293(A) |
申请公布日期 |
2005.10.06 |
申请号 |
JP20040091732 |
申请日期 |
2004.03.26 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
ONISHI TAKASHI;KATO SHINICHI;KATSUYAMA MASAMI |
分类号 |
H01J37/305;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01J37/305 |
代理机构 |
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地址 |
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