发明名称 ELECTRON BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To lessen the re-incidence of re-reflected electron on an object in an electron beam device. SOLUTION: The electron beam device having a radiation mechanism that generates the electron beam and radiates the same to the object and a re-reflection preventive mechanism that re-reflects the reflected electron reflected from the object in a direction different from the direction that the reflected electron beam comes in. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005277293(A) 申请公布日期 2005.10.06
申请号 JP20040091732 申请日期 2004.03.26
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ONISHI TAKASHI;KATO SHINICHI;KATSUYAMA MASAMI
分类号 H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 H01J37/305
代理机构 代理人
主权项
地址