发明名称 CLEANING SHEET AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To surely carry a cleaning sheet to a substrate processing apparatus, and simply and surely remove foreign matter sticking onto the inside of the apparatus by making the cleaning sheet reduced in curling, free from lift of a protection film and excellent in adhesion to a carrier member. SOLUTION: In the cleaning sheet where the protection film with release characteristics is stuck onto a cleaning layer, the protection film comprises a laminated film consisting of a polyolefin film and a plastic film other than the polyolefin film and having a heat shrinkage percentage of not more than 0.1%. The protection film in the cleaning sheet comprises the laminated film of a two-layer structure or a three-layer structure consisting of the polyolefin film and a polyester film. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005270553(A) 申请公布日期 2005.10.06
申请号 JP20040092086 申请日期 2004.03.26
申请人 NITTO DENKO CORP 发明人 FUNATSU ASAMI;TERADA YOSHIO;UENDA DAISUKE
分类号 A47L25/00;B32B27/00;B32B27/32;H01L21/304;(IPC1-7):A47L25/00 主分类号 A47L25/00
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