发明名称 |
Adaptive sampling method for improved control in semiconductor manufacturing |
摘要 |
A method is provided, the method comprising sampling at least one parameter characteristic of processing performed on a workpiece in at least one processing step, and modeling the at least one characteristic parameter sampled using an adaptive sampling processing model, treating sampling as an integrated part of a dynamic control environment, varying the sampling based upon at least one of situational information, upstream events and requirements of run-to-run controllers. The method also comprises applying the adaptive sampling processing model to modify the processing performed in the at least one processing step.
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申请公布号 |
US2005221514(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20050075401 |
申请日期 |
2005.03.08 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
PASADYN ALEXANDER J.;TOPRAC ANTHONY J.;MILLER MICHAEL L. |
分类号 |
H01L21/02;G05B11/42;G05B13/02;G05B13/04;G05B17/02;G05B21/02;(IPC1-7):H01L21/66;G06F19/00;H03M1/60 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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