发明名称 Nitride semiconductor light-emitting device and process for producing the same
摘要 Provided are a nitride semiconductor light-emitting device comprising a polycrystalline or amorphous substrate made of AlN; a plurality of dielectric patterns formed on the AlN substrate and having a stripe or lattice structure; a lateral epitaxially overgrown-nitride semiconductor layer formed on the AlN substrate having the dielectric patterns by Lateral Epitaxial Overgrowth; a first conductive nitride semiconductor layer formed on the nitride semiconductor layer; an active layer formed on the first conductive nitride semiconductor layer; and a second conductive nitride semiconductor layer formed on the active layer; and a process for producing the same.
申请公布号 US2005218416(A1) 申请公布日期 2005.10.06
申请号 US20040898204 申请日期 2004.07.26
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 CHO DONG H.;KOIKE MASAYOSHI;IMAI YUJI;KIM MIN H.;OH BANG W.;HAHM HUN J.
分类号 H01L21/00;H01L21/20;H01L33/06;H01L33/12;H01L33/32;H01L33/42;(IPC1-7):H01L21/00;H01L33/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址