MANUFACTURING METHOD FOR ORGANIC ELECTROLUMINESCENT ELEMENT, FORMING METHOD FOR ELECTRODE OR WIRING CONTAINING CONDUCTIVE OXIDE FILM, MANUFACTURING METHOD FOR ELECTRONIC APPARATUS, ORGANIC ELECTROLUMINESCENT ELEMENT, AND ELECTRONIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To solve the problem of the occurrence of exhibit defective level formation damage in organic material film when forming an electrode material on the organic material film by a reactive sputtering method.

SOLUTION: After laminating a conductive material protection film on the organic material film by non-reactive sputtering method, an electrode is formed from the surface of this film by conversion to an oxide film by making use of a plasma oxidation method using oxygen radical ions by a low electron temperature high-density plasma apparatus. Thus, by conversion of the organic material film to the oxide film in a state covered by a conductive protection film, exhibit defective level formation damage occurring in the organic material film can be controlled.

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