UNSATURATED CARBOXYLIC ACID HEMIACETAL ESTER, POLYMER, AND RESIN COMPOSITION FOR PHOTORESIST

摘要

A polymer comprising repeating units corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1): (1) (wherein R<a> represents hydrogen, halogeno, C1-6 alkyl, or C1-6 haloalkyl; R<b> represents a hydrocarbon group having a hydrogen atom in the 1-position; R<c> represents hydrogen or a hydrocarbon group; and R<d> represents an organic group containing a cyclic skeleton). The polymer may further contain repeating units corresponding to at least one monomer selected among monomers having a lactone skeleton, monomers having a cyclic ketone skeleton, monomers having an acid anhydride group, and monomers having an imide group [excluding the repeating units corresponding to the unsaturated carboxylic acid hemiacetal ester] and/or repeating units corresponding to at least one monomer selected among monomers having a hydroxy group, etc. When used in a photoresist, this polymer has the excellent property to release an acid.