| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus for effectively cleaning a metal stuck to a tool in the tool used in a dry etching apparatus, a CVD (chemical vapor deposition) apparatus, or the like, used in a process for manufacturing a semiconductor, a liquid crystal substrate or a solar battery. SOLUTION: Cleaning by nitric acid and a hydrogen peroxide aqueous solution is carried out using a first cleaning unit (steps S1 to S3). Next, heat treatment loaded with oxygen is carried out to the cleaned tool obtained in the first cleaning unit 1 using a heating unit (step S4). Further, cleaning with an ozone aqueous solution loaded with hydrochloric acid is carried out to the cleaned tool obtained in the heating unit 2 using a second cleaning unit (steps S5 and S6). COPYRIGHT: (C)2006,JPO&NCIPI
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