| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the controllability of a lithography process of a flexible substrate and to prevent the precise scanning motion of a carriage that supports a pattern generator from being blocked even when a flexible substrate is located in the vicinity of an exposure area of the carriage. <P>SOLUTION: A lighting system that forms radiation beams, a pattern generator that performs patterning of the beams, a projection system that performs patterning of the flexible substrate by projecting the pattern beams to a target part of the flexible substrate, and a motion system that controls the motion of the flexible substrate are provided, and the target part of the flexible substrate remains still almost without extending even during the period of exposure by the pattern beams. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
