| 摘要 |
PROBLEM TO BE SOLVED: To make uniform the flow rate of a developer, thereby making uniform a developing rate in the plane of a substrate. SOLUTION: A development device is comprised of the pedestal of mounting the substrate, and a developer supply nozzle for supplying a developer to the substrate mounted on the pedestal. A resist is developed by the development device. Here, the developer supply nozzle for use in the development device contains a deliver port for supplying the developer to the substrate, and a feather-shaped member disposed in the deliver port. Also, this feather-shaped matter is obtained by bundling, for example, a plurality of fibers in a brush shape, and disposed in a vertical direction or a horizontal direction with respect to a moving direction. COPYRIGHT: (C)2006,JPO&NCIPI |
