发明名称 Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel
摘要 It is an object of the invention to continuously perform, under a desired condition and for a long time period, a film formation process capable of producing a high quality film. A film formation apparatus comprises: a discharge outlet disposed within a film formation chamber and facing a film formation surface of a substrate; a material accommodating section disposed outside the film formation chamber and having material containers each containing a film formation material; a heating device for heating the film formation material contained within the material-containers; discharge passages which are air-tightly communicated with the discharge outlet and the material accommodating section; escape passages branching from the discharge passages for diverting the film formation material flowing towards the discharge outlet. On the downstream side of the branching positions of the discharge passages as well as on the escape passages, there are provided flow restricting valves capable of shutting off or passing the film formation material or variably adjusting the flow of the film formation material.
申请公布号 US2005217584(A1) 申请公布日期 2005.10.06
申请号 US20050090048 申请日期 2005.03.28
申请人 TOHOKU PIONEER CORPORATION 发明人 ABIKO HIROSI;MASUDA DAISUKE;UMETSU SHIGEHIRO
分类号 H05B33/10;C23C14/24;C23C14/54;H01L51/50;(IPC1-7):C23C16/00 主分类号 H05B33/10
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