METHOD FOR PRODUCING OXIDE SEMICONDUCTOR THIN FILM BY IRRADIATION WITH ULTRAVIOLET RADIATION

摘要

PROBLEM TO BE SOLVED: To provide a technique by which a metal oxide thin film having electrical conductivity or a photocatalytic function can be formed on a specific part of a substrate by a simple operation. SOLUTION: An organic metal compound as a precursor of a desired metal oxide is dispersed in an organic solvent, and a substrate is immersed in the resulting organic metal compound dispersion and irradiated with laser light in an ultraviolet region (preferably ultraviolet laser having a long wavelength of≥300 nm) to form a thin film of the metal oxide on the irradiated part of the substrate. This method is suitable for producing a thin film of indium oxide, tin oxide, titanium oxide or the like. COPYRIGHT: (C)2006,JPO&NCIPI