| 发明名称 |
Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution |
| 摘要 |
A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.
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| 申请公布号 |
US2005219494(A1) |
申请公布日期 |
2005.10.06 |
| 申请号 |
US20040816170 |
申请日期 |
2004.04.02 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MULDER HEINE M.;BOTMA HAKO |
| 分类号 |
G02B19/00;G03F7/20;H01L21/027;(IPC1-7):G03B27/54 |
主分类号 |
G02B19/00 |
| 代理机构 |
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