| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor, capable of suppressing or preventing the dropping of a processing solution from a processing solution ejection part over a long time and thereby improving the quality of substrate processing. SOLUTION: A processing solution ejection part 15 is held on the tip part of an oscillation arm 19 on which a processing solution pipe 25 is held. The processing solution ejection part 15 comprises a vertical passage 45 formed by the tip part 41 of the processing solution pipe 25, and a nozzle head 42 connected to the outlet of the up/down passage 45. The up/down passage 45 comprises a 1st down passage 46, an up passage 47 and a 2nd down passage 48. When the supply of the processing solution to the processing solution pipe 25 is stopped, the processing solution is separated on a boundary part 55 between the up passage 47 and the 2nd down passage 48, and only the fine quantity of processing solution held on the 2nd down passage 48 side is dropped from the nozzle head 42. COPYRIGHT: (C)2006,JPO&NCIPI
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