<p>An etched dielectric film for use in microfluidic devices. Channels, recesses, and other features can be etched into the films to make them suitable for use in microfluidic devices.</p>
申请公布号
WO2005093009(A1)
申请公布日期
2005.10.06
申请号
WO2005US03736
申请日期
2005.02.07
申请人
3M INNOVATIVE PROPERTIES COMPANY
发明人
KREUTTER, NATHAN P.;YANG, RUI;MAO, GUOPING;AESCHLIMAN, DENNY G.;GUNDEL, DOUGLAS B.;LUENEBURG, DAVID C.
