| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color resist composition which shows high spectral reproducibility, high light resistance and heat resistance by increasing the dye concentration to respond to the request for a thin film color filter, and which has resolution as high as ≤5 μm and no development residue. <P>SOLUTION: The resist composition contains (A) a resin, (B) a photoacid generating agent or a photobase generating agent, (C) a crosslinking compound, and (D) a dye mixture containing a dye having a sulfonic acid aminoester or sulfonic acid ammonium salt structure by 40 to 95 wt.% in the entire dyes. The resin (A) comprises polyvinyl phenol or its copolymer. The composition shows optical characteristics that in the wavelength region of 400 to 700 nm, the composition has at least a region with ≥70% transmittance and a region with ≤10% transmittance. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
