发明名称 Thin-film field-effect transistors and making method
摘要 In a thin-film field-effect transistor having a MIS structure, the insulator layer is formed of cyanoethylated dihydroxypropyl pullulan. The TFT is prepared by applying a cyanoethylated dihydroxypropyl pullulan solution onto a gate electrode in the form of a metal layer, drying the applied solution to form an insulator layer, and thereafter, forming a semiconductor layer thereon.
申请公布号 US2005218450(A1) 申请公布日期 2005.10.06
申请号 US20050092591 申请日期 2005.03.29
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 FUKUI IKUO
分类号 H01L21/28;H01L29/49;H01L51/05;(IPC1-7):H01L29/04 主分类号 H01L21/28
代理机构 代理人
主权项
地址