发明名称 Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
摘要 Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers are disclosed herein. In one embodiment, an ampoule includes a vessel having an interior volume configured to receive a precursor with a headspace above the precursor. The ampoule further includes a carrier gas inlet for flowing carrier gas into the vessel, a conduit having an opening in the precursor and an outlet in the headspace, and a means for flowing precursor through the conduit and into the headspace to increase the surface area of the precursor exposed to the carrier gas.
申请公布号 US2005217575(A1) 申请公布日期 2005.10.06
申请号 US20040814573 申请日期 2004.03.31
申请人 GEALY DAN;WEIMER RONALD A 发明人 GEALY DAN;WEIMER RONALD A.
分类号 C23C16/00;C23C16/448;(IPC1-7):C23C16/00 主分类号 C23C16/00
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