发明名称 |
Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers |
摘要 |
Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers are disclosed herein. In one embodiment, an ampoule includes a vessel having an interior volume configured to receive a precursor with a headspace above the precursor. The ampoule further includes a carrier gas inlet for flowing carrier gas into the vessel, a conduit having an opening in the precursor and an outlet in the headspace, and a means for flowing precursor through the conduit and into the headspace to increase the surface area of the precursor exposed to the carrier gas.
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申请公布号 |
US2005217575(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20040814573 |
申请日期 |
2004.03.31 |
申请人 |
GEALY DAN;WEIMER RONALD A |
发明人 |
GEALY DAN;WEIMER RONALD A. |
分类号 |
C23C16/00;C23C16/448;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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