| 摘要 |
A scanning exposure apparatus for exposing a substrate ( 8 ) to a pattern with an original ( 1 ) through a projection optical system ( 5 ), while scanning the original and the substrate, includes a first detection system ( 14 c) which detects a first substrate reference mark ( 18 c 1, 18 c 3 ) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system ( 2, 9 ) which aligns the original and the substrate on the basis of a detection result of the first detection system.
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