| 摘要 |
PROBLEM TO BE SOLVED: To provide a display device manufacturing method directed toward reduction in manufacturing man-hour. SOLUTION: The display device manufacturing method is characterized by forming a semiconductor layer on the upper surface of a substrate, forming an insulating film on the upper surface of the semiconductor layer, performing impurity implantation into the semiconductor layer in a 2nd area through the insulating film using a mask covering a 1st area but exposing the 2nd area, removing the mask then etching the surface of the insulating film in the 1st and 2nd areas to the extent that the insulating film in the 2nd area remains, and thereby making the film thickness of the insulating film in the 2nd area thinner than that of the insulating film in the 1st area. COPYRIGHT: (C)2006,JPO&NCIPI |
