| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam drawing device sharply improved in the throughput of drawing an IC pattern. SOLUTION: The device comprises a library memory 17 for storing library figure data, a drawing memory 26 for storing data of the number of times of successively calling the library figure data and figure data other than library figures, calling processing means 28 for calling the library figure data stored in the library memory 17 in conformity with the calling number data from the drawing memory 26, a conversion processing device 29 for converting the library figure data and the figure data other than the library figures to drawing device data, and a temporary storage memory 31 having a higher read speed than a library memory 27 provided between the drawing memory 26 and the calling processing means 28. COPYRIGHT: (C)2006,JPO&NCIPI
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