| 摘要 |
PROBLEM TO BE SOLVED: To provide a stage apparatus, etc. whereby in an exposure apparatus using an electron beam, the reaction force and vibration caused by the movement of its stage are so suppressed without giving a wrong effect to the electron beam as to be able to increase its speed, acceleration, and accuracy. SOLUTION: The stage apparatus 20 has a main movable body 230, a first counter mass 240, a second counter mass 250, a first electromagnetic actuator 221 comprising a first armature unit 221A coupled to the main movable body 230 and a first magnet unit 221B coupled to the first counter mass 240, and a second electromagnetic actuator 252 comprising a second magnet unit 252B coupled to the first counter mass 240 and a second armature unit 252A coupled to the second counter mass 250. Here, the main movable body 230 and the second counter mass 250 are so moved respectively in reciprocal directions as to cancel a reaction force F1 caused by the movement of the main movable body 230. COPYRIGHT: (C)2006,JPO&NCIPI
|
