发明名称 ORGANIC MATERIAL DEPOSITION APPARATUS AND DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an organic material deposition apparatus and a deposition method where, for preventing the sagging of the central part in a substrate by gravity in a deposition process for the substrate, tensile force is applied to one side of the substrate in a state where both the sides thereof are fixed, thus the sagging phenomenon of the substrate can be prevented. SOLUTION: The organic material deposition apparatus comprises: a chamber 110 provided with an internal space isolated from the outside, and provided with an entrance to which a substrate is carried-in or carried-out on on side; a substrate loading stand 200 provided on the upper side in the chamber 10, fixing both the ends of the carried substrate by pressurizing force, respectively, moving one end in both the fixed ends of the substrate to the outside direction, and applying tensile force to the substrate so as to reduce the amount of the substrate to be sagged; a rotary elevation part 300 joined to the upper central part of the substrate loading stand 200 and allowing the substrate loading stand 200 to rotate or elevate; and a heating part 140 and an organic material boat 42 provided at the lower part in the chamber 110 and vaporizing the organic material, so as to be evaporated to the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005273014(A) 申请公布日期 2005.10.06
申请号 JP20050057937 申请日期 2005.03.02
申请人 DOOSAN DND CO LTD 发明人 HWANG CHANG-HUN;LIM GUN-MOOK;WON YOU-TAE;NOH SOK-WON;KIM KWANG-HO;KANG TAEK-SANG;KIM SEUNG-HAN
分类号 H05B33/10;B05D7/24;C23C14/12;C23C14/24;C23C14/50;C23C14/56;H01L51/50;H05B33/14;(IPC1-7):C23C14/24 主分类号 H05B33/10
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