发明名称 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
摘要 To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.
申请公布号 US2005221203(A1) 申请公布日期 2005.10.06
申请号 US20050085274 申请日期 2005.03.22
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 FUJII GEN
分类号 G03F7/004;G03F7/20;G03F9/00;H01L21/208;H01L21/28;H01L21/3205;H01L21/336;H01L21/77;H01L29/49;(IPC1-7):G03F9/00 主分类号 G03F7/004
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