发明名称 |
Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus |
摘要 |
To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.
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申请公布号 |
US2005221203(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20050085274 |
申请日期 |
2005.03.22 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
FUJII GEN |
分类号 |
G03F7/004;G03F7/20;G03F9/00;H01L21/208;H01L21/28;H01L21/3205;H01L21/336;H01L21/77;H01L29/49;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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