| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing a foreign matter on the laminating surface of a laminated film simply and certainly, dispensing with the installation of a clean room, exerting no thermal and chemical effect on a base material and using no medium for removing the foreign matter. SOLUTION: A process for uniformly irradiating the laminating surface of a film with an ultra-short pulse laser beam with a pulse width of one picosecond or below to remove the foreign matter bonded to the surface of the film is provided in a laminating process of a multilayered film formed by laminating a plurality of layers different in refractive index on a transparent support, the energy of the laser beam to be irradiated is low flurence in the vicinity of an ablation threshold value or below the ablation threshold value. COPYRIGHT: (C)2006,JPO&NCIPI |
