发明名称 |
Photoresist transfer pads |
摘要 |
A resist transfer pad and method of use are described for forming a uniform photoresist on the surface of a workpiece such as a slider. The resist transfer pad includes a layer of cured polydimethylsiloxane (PDMS) on a cushioning layer, e.g. silicone rubber, and an optional stiffening layer. The sliders are preferably mounted on a carrier or pallet. In one preferred embodiment the loaded resist transfer pads are applied to the slider surface by roll lamination where the loaded resist transfer pad is transported by a roller system using a cover-tape and pressed against the slider surface. Subsequently the cover-tape and the resist transfer pad are lifted off and the photoresist remains on the transducer. An alternative embodiment uses a vacuum, piston laminator to press the loaded resist transfer pad onto the surface of the transducer.
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申请公布号 |
US2005219754(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20040814933 |
申请日期 |
2004.03.30 |
申请人 |
BUCHAN NICHOLAS I;HWANG CHERNGYE;REILEY TIMOTHY;ZHENG LI |
发明人 |
BUCHAN NICHOLAS I.;HWANG CHERNGYE;REILEY TIMOTHY;ZHENG LI |
分类号 |
G11B5/127;G11B5/31;G11B5/33;G11B5/60;G11B15/64;G11B17/32;G11B21/20;(IPC1-7):G11B5/60 |
主分类号 |
G11B5/127 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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