发明名称 |
Film-depositing target and preparation of phase shift mask blank |
摘要 |
For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful. |
申请公布号 |
US2005217988(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20050093297 |
申请日期 |
2005.03.30 |
申请人 |
TOPPAN PRINTING CO., LTD. |
发明人 |
YOSHIKAWA HIROKI;ISHIHARA TOSHINOBU;OKAZAKI SATOSHI;INAZUKI YUKIO;SAGA TADASHI;OKADA KIMIHIRO;IWAKATA MASAHIDE;HARAGUCHI TAKASHI;FUKUSHIMA YUICHI |
分类号 |
G03F1/08;C23C14/06;C23C14/34;G03F1/00;G03F1/32;G03F1/54;G03F1/68;H01L21/027;(IPC1-7):C23C14/32 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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