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发明名称
Lithographic apparatus and device manufacturing method
摘要
申请公布号
EP1582928(A1)
申请公布日期
2005.10.05
申请号
EP20050251565
申请日期
2005.03.15
申请人
ASML NETHERLANDS B.V.
发明人
VAN DER FELTZ, GUSTAAF WILLEM;HOEFNAGELS, JOHAN CHRISTIAAN GERARD;GUI, CHENG-QUN
分类号
G03F7/20;H01L21/027;(IPC1-7):G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
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