发明名称 METHOD OF ATTACHING LAYER MATERIAL AND FORMING LAYER IN PREDETERMINED PATTERN ON SUBSTRATE USING MASK
摘要 Upon formation of a layer such as an emissive layer of an organic EL element by attaching an emissive material onto a substrate (10), an evaporation mask (100) including an opening (110) corresponding to the layer formed to have a plurality of individual patterns and having an area, for example, smaller than the substrate is disposed between the substrate (10) and a material source (200). A relative position between the mask (100) and the material source (200), and the substrate (10) is slid by a predetermined pitch corresponding to the size of a pixel of the substrate (10), thereby forming a material layer (such as the emissive layer 64) in a predetermined region of the substrate. As a result, the material layer can be formed on the substrate through, for example, evaporation with a high accuracy. <IMAGE>
申请公布号 KR100518709(B1) 申请公布日期 2005.10.05
申请号 KR20010059939 申请日期 2001.09.27
申请人 发明人
分类号 H05B33/10;C23C14/04;G09F9/00;G09F9/30;H01L27/32;H01L51/00;H01L51/30;H01L51/40;H01L51/50;H01L51/56;H05B33/12 主分类号 H05B33/10
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