| 摘要 |
The invention relates to fluorine production, in particular to methods for producing fluorine from solid-phase metal fluorides and the complex salts thereof by thermal decomposition. Gaseous fluorine is used for many purposes such as the production of fluorine compounds by direct fluorination, for metal welding, for producing protective films on metals during machining metals and alloys, etc and in the form of etching reagent for microelectronics. Manganese salts with a high fluorine content, i.e. manganese tetrafluoride MnF4 and other salts, for example K3 NiF7, K2NiF7, K2CuF6and analogous compounds are used as initial compounds. The invention ensures a fluorine yield which is equal or higher than 99.0 %. The inventive method is safe and easily used for production.
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