Film-depositing target and preparation of phase shift mask blank
摘要
For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.
申请公布号
EP1582921(A2)
申请公布日期
2005.10.05
申请号
EP20050252048
申请日期
2005.03.31
申请人
SHIN-ETSU CHEMICAL CO., LTD.;TOPPAN PRINTING CO., LTD.