发明名称 E-beam voltage potential circuit performance library
摘要 Point-by-point image contrast values are generated from secondary electron collection during unbiased electron or ion beam bombardment of an integrated circuit (IC) in a vacuum environment to quantify the physical and electrical integrity of connections within the device. These values are stored for each type of circuit cell under standard conditions to quantify and check the performance of individual cells on the device.
申请公布号 US6952106(B1) 申请公布日期 2005.10.04
申请号 US20030681544 申请日期 2003.10.08
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 NG WILLIAM;WEAVER KEVIN;GEMMILL ZACHARY JOSHUA
分类号 G01R31/307;(IPC1-7):G01R31/307 主分类号 G01R31/307
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