发明名称 Method and processing system for determining coating status of a ceramic substrate heater
摘要 A method and system for monitoring coating status of a ceramic substrate heater in a process chamber. The method includes heating a ceramic substrate heater to a desired temperature, exposing the ceramic substrate heater to a reactant gas during a process, and monitoring optical emission from the heated ceramic substrate heater to determine coating status of the ceramic substrate heater. Processes that can be monitored include a chamber cleaning process and a chamber conditioning process.
申请公布号 US2005214445(A1) 申请公布日期 2005.09.29
申请号 US20040811574 申请日期 2004.03.29
申请人 TOKYO ELECTRON LIMITED 发明人 WAJDA CORY;O'MEARA DAVID L.
分类号 B05C11/00;B05D1/00;C23C16/00;C23C16/52;H01C17/065;H01C17/075;H01L21/00;(IPC1-7):B05C11/00 主分类号 B05C11/00
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