发明名称 |
Method and processing system for determining coating status of a ceramic substrate heater |
摘要 |
A method and system for monitoring coating status of a ceramic substrate heater in a process chamber. The method includes heating a ceramic substrate heater to a desired temperature, exposing the ceramic substrate heater to a reactant gas during a process, and monitoring optical emission from the heated ceramic substrate heater to determine coating status of the ceramic substrate heater. Processes that can be monitored include a chamber cleaning process and a chamber conditioning process.
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申请公布号 |
US2005214445(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
US20040811574 |
申请日期 |
2004.03.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
WAJDA CORY;O'MEARA DAVID L. |
分类号 |
B05C11/00;B05D1/00;C23C16/00;C23C16/52;H01C17/065;H01C17/075;H01L21/00;(IPC1-7):B05C11/00 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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