| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a CMP pad conditioner capable of uniformly processing a pad so as not to cause partial abrasion in the pad, by reducing damage of abrasive grains of an outer peripheral part. <P>SOLUTION: A conditioning disc 1 is formed by fixing the abrasive grains 3 to the grinding side whole surface of base metal 2. The base metal 2 is composed of a central side flat part 4, and an outer peripheral side inclined part 5. The inclined part 5 is formed of a curved surface having predetermined curvature so as to reduce thickness toward the outer periphery from the flat part 4. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
