| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask flaw inspection device capable of inspecting the flaw of a mask at once even if the pattern of the mask becomes thick in spite of shortening the wavelength of illumination light and capable of also easily discriminating the kind of the flaw. <P>SOLUTION: The mask flaw inspection device is provided with an illumination optical system 2 for illuminating the mask 4 having a pattern formed thereto, at least a pair of detection optical systems 15, 16 having the object lens OL facing to the mask 4 and detection sensors 17 and 19 to respectively taking in the illumination lights from mutually different illumination regions through the object lens OL, and a mask moving mechanism 22 for altering the confocal relation of the pattern region in the film thickness direction of the mask and the pattern image obtained by the detection sensors 17 and 19 so that the pattern image obtained by the detection sensors 17 and 19 changes with respect to the film thickness direction of the mask 4. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
