LIQUID PROCESSING APPARATUS AND PROCESS OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To perform continuous liquid processing of a substrate uniformly and efficiently. SOLUTION: A straightening vane 33 is provided in a processing tank 20 and a substrate 1 is etched with processing liquid after it is introduced into the processing tank 20 from a substrate inlet 21 before being led out from a substrate outlet 22. The substrate 1 and the straightening vane 33 are inclined to rise forward and the processing liquid is supplied into the processing tank 20 from the inlet 32a of a temporary storage section 32 provided at the upper part of the end wall 20c of the processing tank 20 substantially over the entire length of the end wall 20c. COPYRIGHT: (C)2005,JPO&NCIPI