| 摘要 |
A high frequency reaction processing system comprising an outer container ( 40 ) made of a dielictric material and having two end faces, which can close the inner cavity, one or more high frequency wave coupling portion ( 42 ) disposed at arbitrary position on the outer surface of the outer container ( 40 ), one or more inner container ( 41 ) made of a dielectric material and having two end faces, which can closeg the inner cavity, disposed at a position for receiving a high frequency wave guided through the high frequency wave coupling portion ( 42 ) without touching the inner side face of the outer container ( 40 ), and a covering portion ( 43 ) made of a conductive material, for covering the outer surface of the outer container except for the area occupied with the high frequency wave coupling portion ( 42 ) and sustaining the potential at a level equal to the ground potential of a waveguide line.
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